OSAKA – Sharp Corp. says that its Plasmacluster ion expertise, designed to disinfect and deodorize air, is additionally beneficial in promoting hair increase — a declare that comes because the electronics enterprise looks to market new elegance items using the technology.
The business stated Thursday exterior stories it commissioned have validated that the Plasmacluster ion know-how helps increase the ability of scalp skin to retain moisture, creating a higher ambiance for hair growth.
In an scan, 115 individuals, ranging in age from their 20s to 70s, shaved a 2 centimeter round spot on the appropriate and left aspects of their heads.
The shaved spot on the correct aspect of each and every head was exposed to Plasmacluster ions for some 20 minutes day to day whereas the different facet become left untreated.
The number of hairs that grew in the shaved spots on the correct side become found to be 2.5 times the quantity on the left aspect, in accordance with Sharp.
In a further test involving fifty nine ladies between the a while of forty and 63, unshaven scalps on about half the topics have been uncovered to the ions for five minutes a day for 12 weeks. The quantity of oil on their scalps reduced greater than the quantity for the ultimate women, whose scalps have been no longer exposed to Plasmacluster ions, Sharp observed.
The ion know-how additionally decreased by means of sixty four percent the bacteria that explanations dandruff and scalp itching, the company added.
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